0010‑23716 AMAT Chamber Manifold Signal Interface Assembly

Short Description:

AMAT 0010‑23716 chamber manifold & signal interface assembly, process chamber sp

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Product Detail

AMAT 0010‑23716 chamber manifold & signal interface assembly, process chamber spare component for Applied Materials Centura Endura semiconductor wafer processing platforms.

Product Overview

Part No: 0010‑23716
Brand: AMAT (Applied Materials)
Category: Chamber Manifold Signal Interface Assembly0010‑23716 is an integrated manifold and signal interface assembly designed for AMAT semiconductor process platforms. It serves as the central junction unit for process chamber, integrating gas pipeline connections, sensor signal routing, vacuum interlock and safety signal terminals. The assembly transmits MFC control signals, chamber sensor feedback and hardware interlock signals between process chamber and system main controller, ensures stable gas delivery and real‑time safety monitoring during thin‑film deposition processes. Built for clean‑room high‑vacuum operating conditions, it adopts low‑particulate material and high‑reliability connectors to reduce particle contamination risk for wafer production. It is an important field‑replaceable spare part for chamber maintenance, overhaul and retrofit of AMAT 200mm / 300mm wafer fabrication tools.

Core Features

Integrated gas manifold and multi‑channel signal terminal for process chamber
Routes MFC control, pressure sensor, temperature sensor and vacuum interlock signals
High‑reliability vacuum‑compatible connectors for clean‑room semiconductor environment
Low‑particle emission mechanical construction to avoid wafer contamination
Modular assembly structure supporting fast disassembly and on‑site replacement
Strict mechanical tolerance matching for chamber gas box installation
Resists process‑related thermal cycling inside deposition chamber cabinet
Designed for continuous long‑term operation under fab production duty cycle

Technical Specifications

Operating Environment: Clean‑room, high‑vacuum compatible
Applicable Wafer Size: 200mm, 300mm
Operating Temperature: 0°C ~ +70°C
Storage Temperature: ‑40°C ~ +85°C
Installation: Bolt‑on modular assembly mounted on process chamber gas box

Compatibility & Application

Compatible with AMAT Centura, Endura and Producer series processing platforms
Applied in PVD, CVD thin‑film deposition chambers within semiconductor wafer fabs
Functions for gas distribution, sensor signal collection and chamber safety interlock control